Directed selfassembly lithography for halfpitch sub15 nm pattern fabrication process volume 1750 hironobu sato, yuriko seino, naoko kihara, yusuke kasahara, katsutoshi kobayashi, katsuyoshi kodera, hideki kanai, yoshiaki kawamonzen, shinya minegishi, ken miyagi, toshikatsu tobana, noriyuki hirayanagi, tomoharu fujiwara, tsukasa azuma, teruaki hayakawa. Physical design and mask synthesis for directed selfassembly. Combining lithography and directed self assembly for the. Basics of block copolymer directed self assembly block copolymer directed self assembly dsa is a technique used to create high resolution structures without advanced lithography techniques. To date, the most significant impact of dsa has been for the fabrication of nanoimprint master molds for bitpatterned magnetic storage media. May 01, 2010 a study of virtual lithography process for polymer directed self assembly a study of virtual lithography process for polymer directed self assembly kim, sangkon. Pattern scaling with directed self assembly through. Aug 12, 2015 improving the lithographic process window using directed selfassemblyaware printing assist features article pdf available in journal of micro nanolithography, mems, and moems 143. Self assembly based manufacturing refers to a controlled process of using self assembly and programmable matter to manufacture a product on an industrial scale. Directed selfassembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. Lithographically directed self assembly of nanostructures 34 j v s tbm i c r o e l e c t r o n i c sa n d nanometer structures surface energies of the liquid. Find support for a specific problem on the support section of our website.
Directed selfassembly of a colloidal kagome lattice nature. However, when using dsa in high volume manufacturing, one must have a way to quantify the degree of order of linespace patterns formed by. Directed self assembly dsa for contact layers is a challenging process in need of reliable metrology for tight process control. An efficent approach to molecular selfassembly having received ample attention during the last decade is the creation of selfassembled. Directed self assembly materials for semiconductor lithography shinya minegishi, takehiko naruoka and tomoki nagai fine electronic research laboratories semiconductor materials laboratory jsr corporation 100, kawajiricho, yokkaichi mie 5108552 japan the directed self assembly dsa method is becoming a key complementary technology for. Economics dictated that semiconductor devices need to be scaled approximately to 70 percent linearly in order to follow the pace of moores law and maintain. The file contains supplementary figures with legends and full legends for supplementary movies. Surface patterns generated by conventional photolithography, such.
Molecular selfassembly 1 is the assembly of molecules without guidance or management from an outside source. Selfassembling block copolymers are of interest for. Directed selfassembly of block copolymers for next. Phd scholarship in nanopatterning of 2d materials by. Block copolymer directed selfassembly bcp dsa is the leading candidate for. Characterization of block copolymer directed self assembly. The directed selfassembly dsa and pattern transfer of poly5vinyl1,3benzodioxoleblockpentamethyldisilylstyrene pvbdbpdss is reported.
Molecular self assembly 1 is the assembly of molecules without guidance or management from an outside source. Multifunctional hardmask neutral layer for directed self. Filtration on block copolymer solution used in directed self. Line edge roughness of directed self assembly pspmma block. Directed selfassembly of block copolymers for next generation nanolithography. Lithographically directed selfassembly of nanostructures 3410 j. Keywords vlsi cad for dsa physical design for dsa dsafriendly vlsi design dsa. Strategies for integration of directed selfassembly with. Characterization of the selfassembly process on transition metal dichalconide layers using thermal or solvent annealing. One such example is the self assembly of the lipid bilayer membrane in cells. Pattern orientation control for directed self assembly lithography a block copolymer consisting of two segregated polymer blocks linked by a chemically covalent bond forms self assembled nanometerscale patterns, whose size does not depend on a lithographic exposure tool but on the molecular weight. After the recent implementation of dsa processes in 300mm clean room.
Directed selfassembly of block copolymers for use in bit patterned. Create longrange order in the selfassembled structures align structures to existing patterns on the substrate two approaches to dsa fieldguided selfassembly. Lithographically directed selfassembly of nanostructures 34 j v s tbm i c r o e l e c t r o n i c sa n d nanometer structures surface energies of the liquid. Besides block copolymer, gel defects in neutral layer is another concern in directed self assembly lithography. Directed selfassembly lithography for halfpitch sub15 nm. Thermal scanning probe lithography for the directed selfassembly. Directed self assembly is a leadingedge technique for nextgeneration lithography, harnessing the thermodynamic properties of block copolymers to create sub22nm features without the need for euv equipment or numerous multipatterning steps. Nanospheres lithography nsl is a manufacturing technique based on the self assembly sa process of colloidal spheres 1. The combination of lithography and selfassembly provides a powerful means of organizing solutionsynthesized nanostructures for a wide variety of applications. Dsa has shown the capability for pitch reduction multiplication, hole shrinks, cd self healing as well as a pathway towards line edge roughness ler and pattern collapse improvement 14. Line edge roughness of directed self assembly pspmma block copolymers a possible candidate for future lithography courtesy of p. Basics of block copolymer directed self assembly stanford. Directed selfassembly lithography dsal is a highly promising patterning solution in sub7nm technology.
In addition to providing resolution beyond the current optical limits, dsa has the potential to reduce or eliminate problems with pattern collapse and line edge roughness. Defect probability of directed selfassembly lithography. Dsa integrates bottomup selfassembly with topdown conventional lithography 8, 16, 20. Directed block copolymer selfassembly for nanoelectronics. Directed selfassembly of liquid crystalline bluephases into. Recently, directed self assembly lithography dsal is attracting attention as a lowcostandfinepatterningmethod. To achieve this goal, largescale templates, with different size and shape, were generated by direct laserwriter lithography over square millimetre areas. Flexible and precise dsa control of 25 nm contact holes guided by 66 nm templates for industry. One candidate is directed selfassembly, in which patterned features created by traditional lithography techniques direct the selfassembly of c96 fibers. Contact hole shrink process using graphoepitaxial directed. Modeling of block copolymer dry etching for directed self.
An efficent approach to molecular self assembly having received ample attention during the last decade is the creation of self assembled. Directed self assembly dsa is a promising solution to reduce the number of patterning steps further, as it allows assigning to the same mask a sublayout that is not lithographyfeasible. Surfaceimaging of frozen blue phases in a discotic liquid crystal with atomic force microscopy. Directed selfassembly of a twostate block copolymer system. Lithographicallydirected selfassembly of nanostructures. Key parameters of interest are guide cd, polymer cd, and residual polymer thickness at the bottom of the guide cavity. Multiple lithography method for directed materials assembly. Directed selfassembly of block copolymers for next generation. Pdf directed selfassembly of block copolymers for universal. Although extreme ultraviolet lithography and nanoimprint lithography have better resolution than arf immersion lithography, they are still facing many challenges with performance, throughput, and cost. Among these methods, block copolymer directed self assembly dsa has gained traction as a lowcost, highthroughput method to pattern sub20 nm contacts in integrated circuits 1. Nanoelectronics research institute imec leuven, belgium is presenting details on improvements in directed self assembly dsa process development at this weeks spie advanced lithography conference, being held in san jose, calif. This paper provides an overview of directed self assembly dsa options that exhibit potential for enabling extensible highvolume patterning of nanoelectronics devices.
Aware placement dsaaware routing dsaaware mask optimization dsaaware opc dsa verification multipatterning with dsa inverse dsa nanolithography computational. Pdf directed selfassembly of block copolymers for next. Supporting information for directed selfassembly of silicon. Selfassembly based manufacturing refers to a controlled process of using selfassembly and programmable matter to manufacture a product on an industrial scale. One such example is the selfassembly of the lipid bilayer membrane in cells. A study of virtual lithography process for polymer directed. Directed selfassembly and pattern transfer of five. Sep 27, 2018 directed self assembly dsa addresses these issues by using graphoepitaxial 11,12,14 andor chemoepitaxial 15,16,17,18,19 templates, fabricated by conventional lithography techniques, to guide the self assembly of thin films of block copolymers. Lithography precise, but expensive and difficult at small sizes file type. Nanomaterials free fulltext directed selfassembly of. Jan 19, 2011 the file contains supplementary figures with legends and full legends for supplementary movies. Supporting information for directed selfassembly of siliconcontaining block copolymer thin films michael j.
Directed selfassembly dsa dsa is a bridge between topdown and bottomup patterning can leverage existing patterning methods two possible goals for dsa. The method described herein with respect to method for designing optical lithography masks for directed selfassembly may be practiced with a generalpurpose computer and the methods described supra in the flow diagrams of figs. Directed selfassembly of polystyrene nanospheres by. We show that optical cd ocd provides the needed performance for dsa contact metrology. It describes the current set of research requirements, which a dsa technology must satisfy to warrant insertion consideration, and summarizes the stateofthe art. Pdf lithographicallydirected selfassembly of nanostructures. Directed selfassembly of a colloidal kagome lattice. Figures 27 and 28 were changed in the online pdf to match the full text html. This intro to dsa is geared towards those with little to no background and are interested in learning more. This paper provides an overview of directed selfassembly dsa options that exhibit potential for enabling extensible highvolume patterning of nanoelectronics devices.
Hybrid approach to optical cd metrology of directed self. Thermal scanning probe lithography tspl is applied to the fabrication of chemical guiding patterns for directed selfassembly dsa of block. We have developed a fluidic assembly method that relies on the local pinning of a moving liquid contact line by lithographically produced topographic features to. Abstractas directed selfassembly of block copolymers becomes an increasingly viable alternative to traditional optical lithography, it comes increasingly important to develop methods of characterizing the selfassembled structures for defects. Directed self assembly lithography for halfpitch sub15 nm pattern fabrication process volume 1750 hironobu sato, yuriko seino, naoko kihara, yusuke kasahara, katsutoshi kobayashi, katsuyoshi kodera, hideki kanai, yoshiaki kawamonzen, shinya minegishi, ken miyagi, toshikatsu tobana, noriyuki hirayanagi, tomoharu fujiwara, tsukasa azuma, teruaki hayakawa. Directed self assembly lithography dsal is a highly promising patterning solution in sub7nm technology. In directed selfassembly lithography dsal, an intercell cluster of contacts, which crosses the boundary of cells, is more likely to cause patterning failure because corresponding guide pattern gp has not been verified beforehand. Directed assembly or more specifically directed self assembly, can produce a high pattern resolution 10 nm with high efficiency and compatibility.
The inset is a schematic of the contact line motion as the. Directed assembly or more specifically directed selfassembly, can produce a high pattern resolution 10 nm with high efficiency and compatibility. To find appropriate filtration, we studied gel reduction in neutral layer materials. The first molecular machines by design have been built. Directed assembly using block copolymers has been achieved. Choice and possibly synthesis of block copolymers suitable for directed selfassembly structuring by lithography of transition metal dichalconide e. Method for designing optical lithography masks for directed. Approach is possibly the only viable method to produce sub22 nm based integrated circuits without the use of directed self assembly. It covers the basic background of dsal technology, physical design optimizations such as placement and redundant via insertion, and dsal mask synthesis as well as its verification. It covers the basic background of dsal technology, physical design optimizations such as placement.
Reactive ion etching was used to selectively remove the pvbd block, and fingerprint patterns were subsequently transferred into. Neutral layer material filtration for directed self assembly. Nanoelectronics research institute imec leuven, belgium is presenting details on improvements in directed selfassembly dsa process development at this weeks spie advanced lithography conference, being held in san jose, calif. Directed selfassembly of nematic liquid crystals on chemically patterned surfaces. Mos2 layers to generate nanopore arrays in 2d materials.
In this work, we performed a systematic study on the effect of the geometry of prepatterned templates and spincoating conditions on the self assembling process of colloidal nanospheres. Computational modeling is crucial in optimizing polymer formulations, producing a better pattern, or predicting the defect density. As conventional optical lithography approaches its limit in resolution, it becomes increasingly necessary to explore alternative forms of lithography. Directed self assembly dsa dsa is a bridge between topdown and bottomup patterning can leverage existing patterning methods two possible goals for dsa. Among these methods, block copolymer directed selfassembly dsa has gained traction as a lowcost, highthroughput method to pattern sub20 nm contacts in integrated circuits 1. Pattern orientation control for directed selfassembly. Not all sublayouts are allowed, and the geometry of the vias within the feasible sublayouts is specific to the technology. Lithography precise, but expensive and difficult at small sizes self assembly of. Characterization of directed selfassembly patterns in peanut.
It uses light to transfer a geometric pattern from a photomask also called an optical mask to a photosensitive that is, lightsensitive chemical. Directed selfassembly for lithography applications request pdf. In traditional manufacturing and fabrication, there are physical and precision limitations on a workpiece. Directed selfassembly dsa advanced lithography materials. However, when using dsa in high volume manufacturing, one must have a way to quantify the degree of order of linespace patterns formed by dsa in order to reduce defect. In the formation of twohole contact pairs inside peanutshaped. Improving the lithographic process window using directed selfassemblyaware printing assist features article pdf available in journal of micro nanolithography, mems, and. Directed self assembly materials for semiconductor lithography. Directed selfassembly dsa addresses these issues by using graphoepitaxial 11,12,14 andor chemoepitaxial 15,16,17,18,19 templates, fabricated by conventional lithography techniques, to guide the selfassembly of thin films of block copolymers.
Lamellaeforming pvbdbpdss can form well resolved 5 nm halfpitch features in thin films with high etch selectivity. Selfassembly materials self assembly and lithography. Directed selfassembly dsa is currently being explored as a new method for substituting resist in sub14 nm technologies. Directed selfassembly of psbpmma block copolymer using hsq.
Recently, directed selfassembly dsa of bcps has received enormous research. Recently, directed selfassembly lithography dsal is attracting attention as a lowcostandfinepatterningmethod. Create longrange order in the self assembled structures align structures to existing patterns on the substrate two approaches to dsa fieldguided self assembly. Directed selfassembly dsa of nanoscale devices commonly combines selfassembling materials such as block copolymers bcps with lithographically defined prepatterned surfaces. Directed assembly of micro and nanostructures wikipedia.
Modeling of block copolymer dry etching for directed selfassembly lithography zelalem beletea, eberhard baerb, andreas erdmanna b afriedrichalexanderuniversity of erlangennuremberg, chair of electron devices, cauerstrasse 6, 91058 erlangen, germany. The combination of lithography and self assembly provides a powerful means of organizing solutionsynthesized nanostructures for a wide variety of applications. A simulation analysis on defect annihilation in directed self assembly lithography katsuyoshi kodera, hideki kanai, yuriko seino, hironobu sato, yusuke kasahara, katsutoshi kobayashi, hiroshi kubota, naoko kihara, yoshiaki kawamonzen, shinya minegishi, ken miyagi, toshikatsu tobana, masayuki shiraishi, satoshi nomura and tsukasa azuma. Directed selfassembly of block copolymers for nanolithography. Lithographically directed selfassembly of nanostructures. Directed selfassembly of psbpmma block copolymer using hsq lines for translational alignment. Line edge roughness of directed self assembly pspmma. Towards reliable directed selfassembly lithography for. Pattern orientation control for directed selfassembly lithography a block copolymer consisting of two segregated polymer blocks linked by a chemically covalent bond forms selfassembled nanometerscale patterns, whose size does not depend on a lithographic exposure tool but on the molecular weight. Topdown lithography defines the pattern placement, and c96 selfassembly defines the pattern linewidth. Various advanced directed selfassembly approaches are examined, in which block copolymer selfassembly is synergistically integrated with conventional photolithography, such as arf lithography or iline lithography, via either epitaxial selfassembly or the graphoepitaxy principle. Directed self assembly dsa is a promising solution to reduce the number of patterning steps further, as it allows assigning to the same mask a sublayout that is not lithography feasible.
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